Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers


Gokcen D. , Bae S., Brankovic S. R.

ELECTROCHIMICA ACTA, cilt.56, sa.16, ss.5545-5553, 2011 (SCI İndekslerine Giren Dergi) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 56 Konu: 16
  • Basım Tarihi: 2011
  • Doi Numarası: 10.1016/j.electacta.2011.03.102
  • Dergi Adı: ELECTROCHIMICA ACTA
  • Sayfa Sayıları: ss.5545-5553

Özet

The study of the kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers is presented. The model system was Pt submonolayer deposition on Au(1 1 1) via red-ox replacement of Pb and Cu UPD monolayers on Au(1 1 1). The kinetics of a single replacement reaction was studied using the formalism of the comprehensive analytical model developed to fit the open circuit potential transients from deposition experiments. The practical reaction kinetics parameters like reaction half life, reaction order and reaction rate constant are determined and discussed with their relevance to design and control of deposition experiments. The effects of transport limitation and the role of the anions/electrolyte on deposition kinetics are investigated and their significance to design of effective deposition process is discussed. (C) 2011 Elsevier Ltd. All rights reserved.