Akademik Veri Yönetim Sistemi
5th International Conference on Light and Light-based Technologies (ICLLT), Ankara, Türkiye, 15 - 17 Mayıs 2025, ss.47, (Özet Bildiri)
Low-emissivity (low-e) coatings effectively reduce infrared (IR) radiation transfer through windows, which reduces thermal leakage from indoors to the outdoor surroundings. These coatings are transparent to visible light (Transmittance, T = 80– 90%) and present high reflectance within the far infrared range reducing the emissivity coefficient, ε, of the glass (approximately 0.84). The typical configuration of a soft lowe coatings is a three-layer dielectric/metal/dielectric (D/M/D; where D corresponds to dielectric layer, M corresponds to metal layer) stack. In this configuration, while the metallic layers reflect both short-wave and long-wave thermal radiation, the dielectric layers may provide antireflective functions in the visible spectrum while at the same time protecting the metallic layers from chemical and mechanical damage. In this work, the Ag and AZO thin films were deposited from pure Ag and AZO targets, respectively, using RF magnetron sputtering technique. By changing the sputtering power and deposition time, four different Ag thin films with an approximate thickness were deposited. The effects of sputtering power on phase, microstructure, resistivity, optical properties and infrared emissivity of the films were characterized using UV– VIS–NIR spectrophotometery, XRD, SEM, four-point probe and FTIR, respectively. The film thicknesses and sheet resistances of the films were precisely determined simultaneously fitting of the optical transmission and reflectance measurements using Drude-Brendel model. It was observed that the reflectance in visible region as well as the infrared emissivity of Ag films were significantly affected by sputtering power. Ag films deposited at higher plasma power had a higher packing density, exhibited better crystallinity, had a lower resistivity and a lower infrared emissivity. This work proves that adjusting sputtering power is an efficient way to tune the infrared reflection and emissivity of the Ag films. The low-e performance of the coating prepared in the present study is superior compared to those of the studies in the literature due to its both higher visible transmission (78.7%) and far infrared reflection (98%). The results also indicate that AZO/Ag/AZO structure with a high FoM (93.1) value prepared by sequential growth of the each layer using magnetron sputtering technique is a potential candidate to be used as TCEs.