Growth of Si:H thin films by hot filament CVD: mu-Crystalline to amorphous transition
ADVANCES IN CRYSTAL GROWTH, vol.203, pp.167-172, 1996 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 203
- Publication Date: 1996
- Doi Number: 10.4028/www.scientific.net/msf.203.167
- Journal Name: ADVANCES IN CRYSTAL GROWTH
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Aerospace Database, Applied Science & Technology Source, Biotechnology Research Abstracts, Chimica, Communication Abstracts, Compendex, INSPEC, Metadex, Civil Engineering Abstracts
- Page Numbers: pp.167-172
- Hacettepe University Affiliated: No