High frequency capacitively coupled RF plasma discharge effects on the order/disorder structure of PAN-based carbon fiber


ERÖZBEK GÜNGÖR Ü., Bilikmen S., Akbar D.

JOURNAL OF THEORETICAL AND APPLIED PHYSICS, vol.8, no.2, 2014 (Peer-Reviewed Journal) identifier

  • Publication Type: Article / Article
  • Volume: 8 Issue: 2
  • Publication Date: 2014
  • Doi Number: 10.1007/s40094-014-0127-7
  • Journal Name: JOURNAL OF THEORETICAL AND APPLIED PHYSICS
  • Journal Indexes: Emerging Sources Citation Index, Scopus

Abstract

High-resolution confocal Raman microscopy was used to investigate the effects of nitrogen plasma on unsized high strength (HS) PAN-based carbon fiber surfaces. The fibers were treated by a high frequency (40.68 MHz) capacitively coupled single RF-PECVD reactor under different processing conditions (exposure times, RF powers and gas pressures). It was found that the order/disorder structure of the treated carbon fiber changed with different processing conditions. At low pressures, the degree of disordered structure increased with HF-RF power and process time. However, at high pressures, high-order structure (IG/IT = 84.51%) was observed and almost no observable structural effects appeared at long treatment time. Also, the first-order Raman-band peaks (D and G) of the treated carbon fibers shifted. And, FWHM (wD/wG), intensity (ID/IG) and D-band relative integrated intensity (ID/IT) ratios increased with ordering whereas they decreased with disordering.