The changes in growth and photosynthetic performance of two wheat (Triticum aestivum L.) cultivars (Bolal-2973 and Atay-85) differing in their sensitivity to boron (B) toxicity were investigated under toxic B conditions. Eight-day old seedlings were exposed to highly toxic B concentrations (5, 7.5, and 10 mM H3BO3) for 5 and 9 days. Fast chlorophyll a fluorescence kinetics was determined and analysed using JIP test. Growth parameters, tissue B contents, and membrane damage were measured at two stress durations. The photochemical performance of PSII was hindered more in the sensitive cultivar (Atay-85) than that of the tolerant one (Bolal-2973) under B toxicity. The increase in the B concentration and stress duration caused membrane leakage in both cultivars. However, higher membrane damage was observed in Atay-85 compared to Bolal-2973. Additionally, significant reduction of growth parameters was observed in both cultivars at toxic B concentrations. The accumulation of B was higher in shoots than in roots of both cultivars. Nevertheless, Atay-85 translocated more B from roots to leaves compared to Bolal-2973. The advantages of certain JIP test parameters were demonstrated for evaluation of PSII activity in plants exposed to B stress. Evaluation of photosynthetic performance by JIP test as well as assessment of growth and tissue B content might be used to determine the effects of B toxicity in wheat. The results indicated lesser sensitivity to B toxicity in Bolal-2973 compared to Atay-85.